Reduces redness and irritation, making the skin soft and moisturized. Helps restore after exposure to wind, sun, temperature fluctuations and poor environmental conditions. Instantly refreshes, reduces inflammation and provides comfort.
Apply the mask to clean and toned skin. Remove after 15-20 minutes, gently patting with fingertips to help essence absorb.
Water, Pinus Densiflora Leaf Extract, Glycerin, Dipropylene Glycol, Glycereth-26, Centella Asiatica Extract, Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Sodium Hyaluronate, Butylene Glycol, Portulaca Oleracea Extract, Propanediol, Chondrus Crispus, Ethylhexylglycerin, Biosaccharide Gum-1, Glycoproteins, Ammonium Polyacryloyldimethyl Taurate, Tromethamine, Polyglyceryl-4 Caprate, Asiaticoside, Asiatic Acid, Madecassoside, Madecassic Acid, Polyglyceryl-6 Caprylate, Capryloyl Salicylic Acid, Hydroxyethyl cellulose, 1, 2-Hexanediol, Xanthan Gum, Hydroxyacetophenone, Disodium EDTA, Carbomer.